The effects of high-energy electron beam irradiation on the properties of IGZO thin films prepared by rf magnetron sputtering

نویسندگان

  • S. H. Jung
  • H. J. Moon
  • M. K. Ryu
  • K. I. Cho
  • B. S. Bae
  • E.-J. Yun
چکیده

S. H. Jung, H. J. Moon, M. K. Ryu, K. I. Cho, B. S. Bae and E.-J. Yun* College of New IT Engineering, Hoseo University, Asan, Chungnam 336-795, Korea Department of Semiconductor and Display Engineering, Hoseo University, Asan, Chungnam 336-795, Korea Laboratory Oxide Electronics Research Team, ETRI, Daejeon 305-350, Korea Department of Semiconductor and Display Engineering and College of New IT Engineering, Hoseo University, Asan, Chungnam 336-795, Korea Department of Semiconductor and Display Engineering and Department of System Control Engineering, Hoseo University, Asan, Chungnam 336-795, Korea

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

منابع مشابه

The effect of sputtering RF power on structural, optical and electrical properties of CuO and CuO2 thin films

In this paper, the RF power change effect on the structural, optical and electrical properties of CuO thin films prepared by RF reactive magnetron sputtering deposited on glass substrates are studied. At first, the thin films are prepared at 150, 280, 310 and 340W respectively. Then, the films are characterized by XRD, AFM, Uv-visible and four-point probe analysis respectively. The results show...

متن کامل

The Effects of SR Irradiation on Tin-Doped Indium Oxide Thin Film Prepared by RF Magnetron Sputtering

Tin-doped indium oxide (ITO) thin films have been widely used as transparent electrodes of flat panel displays and solar cells because of its low electrical resistivity and high transmittance to visible light. In order to improve the electrical and optical properties of ITO thin films, many attempts have been carried out by means of several methods, for example, highly dense plasma assisted ele...

متن کامل

The Effect of Substrate on Structural and Electrical Properties of Cu3N Thin Film by DC Reactive Magnetron Sputtering

The aim of this paper is to study the effect of substrate on the Cu3N thin films. At first Cu3N thin films are prepared using DC magnetron sputtering system. Then structural properties, surface roughness, and electrical resistance are studied using X-ray diffraction (XRD), the atomic force microscope (AFM) and four-point probe techniques respectively. Finally, the results are investigated and c...

متن کامل

Effect of Thickness on Properties of Copper Thin Films Growth on Glass by DC Planar Magnetron Sputtering

Copper thin films with nano-scale structure have numerous applications in modern technology.  In this work, Cu thin films with different thicknesses from 50–220 nm have been deposited on glass substrate by DC magnetron sputtering technique at room temperature in pure Ar gas. The sputtering time was considered in 4, 8, 12 and 16 min, respectively. The thickness effect on the structural, mo...

متن کامل

Effect of Thickness on Structural and Morphological Properties of AlN Films Prepared Using Single Ion Beam Sputtering

Aluminum nitride (AlN) thin films have potential applications in microelectronic and optoelectronic devices. In this study, AlN thin films with different thicknesses were deposited on silicon substrate by single ion beam sputtering method. The X-ray diffraction (XRD) spectra revealed that the structure of films with thickness of - nm was amorphous, while the polycrystalline hexagonal AlN with a...

متن کامل

ذخیره در منابع من


  با ذخیره ی این منبع در منابع من، دسترسی به آن را برای استفاده های بعدی آسان تر کنید

برای دانلود متن کامل این مقاله و بیش از 32 میلیون مقاله دیگر ابتدا ثبت نام کنید

ثبت نام

اگر عضو سایت هستید لطفا وارد حساب کاربری خود شوید

عنوان ژورنال:

دوره   شماره 

صفحات  -

تاریخ انتشار 2012